Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition

Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition - Nanoscale patterning of materials is widely used in a variety of device applications. Area selective atomic layer deposition (ALD) has shown promise for deposition of patterned structures with sub-nanometer thickness control. However, the current process is limited in its ability to achieve good selectivity for thicker films formed at higher number of ALD cycles.